Thin film electrode material magnetron sputtering winding continuous production technology

At present, there is a big gap between the quality and performance of domestic supercapacitor electrode film materials and foreign countries, and how to improve product performance, reduce cost and improve the process preparation level are painful issues of great concern to the industry. The most difficult part of film electrode preparation is that there is almost no "off-the-shelf" equipment and process to be used. The plasma physical method and later chemically controlled modification are used to design and prepare additive-free large-area single-component or multi-component supercapacitor electrode thin film materials. Using the principle of magnetron sputtering, the material on the target is sputtered onto the coiled substrate to form a film layer by supplying the material to the target under vacuum conditions, generating plasma and controlling the motion of the plasma with a magnetic field. The technology has the following features: (1) it can produce high purity, high film quality thin film electrode materials with high production efficiency; (2) it can make a variety of different materials into composite thin film electrodes, allowing multiple coating sources (metals, alloys, dielectric materials) to be coated simultaneously, and each functional film layer can be grown in one highly integrated multi-chamber equipment in one step without breaking the vacuum (3) Fine control of film material composition and structure, precise control of process, bi-directional winding design, continuous production process of key electrode materials on a large scale, and mass production of high power electrode materials for supercapacitors. Meanwhile, this continuous coating system is also suitable for coating processing lines in various fields such as photovoltaic and semiconductor.

Figure 1. Magnetron sputtering production thin film electrode mechanism diagram and horizontal continuous winding coating equipment (production line object diagram provided by equipment partner Shenyang Beiyu Vacuum Equipment Company)